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2021326 · Cu-ETP Alloy Designation EN Cu-ETP DIN CEN/TS 13388 CW004A UNS C11000 Chemical Composition (Balance) Weight percentage Cu ≥ 99.90 % O ≤ 0.040 %
contact2020131 · Cu-ETP kommt zum Einsatz, wenn hohe elektrische Leit-fähigkeit verlangt wird (Elektrotechnik, Elektronik) [1]. °C 2. Chemische Zusammensetzung - nach DIN EN
contact2021510 · ETP1 is the highest purity tough pitch copper with a maximum impurity content of 0.0065% (compared to ETP with a maximum of 0.0355). The very high purity
contactWrought and unwrought forging stock. EN 12420: 1999 Copper and copper alloys. Forgings. EN 13148: 2001 Copper and copper alloys. Hot-dip tinned strip. Equivalent grades: Go here. Chemical composition % of grade Cu-ETP ( CW004A ) Cu including Ag < 0.015%; O < 0.06% is permitted.
contact2021728 · T2，C11000，C1100，Cu-ETP，CW004A，2.0065. ，“”、“”“”。. ，，，。. T2，，
contact20181115 · GB DIN EN ISO UNS JIS TU2 OF-Cu 2.0040 Cu-OFE CW009A Cu-OF C10100 C1011 - SE-Cu 2.0070 Cu-HCP CW021A - C10300 - - SE-Cu 2.0070 Cu-PHC CW020A - C10300 - T2 E-Cu58 2.0065 Cu-ETP CW004A Cu-ETP C11000 C1100 TP2 SF-Cu 2.0090 Cu-DHP CW024A
contact2022228 · Cu-ETP. Cu-ETP，Cu-ETP，，. ：Cu-ETP. ： (GB/T5231-2001) ：. ..，。. .，.，“”， ...
contact2021326 · Cu-ETP Alloy Designation EN Cu-ETP DIN CEN/TS 13388 CW004A UNS C11000 Chemical Composition (Balance) Weight percentage Cu ≥ 99.90 % O ≤ 0.040 % Characteristics Cu-ETP is an oxygen containing copper which has a very high electrical and thermal conductivity. It has excellent forming properties. Due to its oxygen
contact20211028 · Electrolytic tough-pitch copper (Cu-ETP) is the standard oxygen containing pure copper grade. It is very commonly used for electronics and electric engineering components in cases that high conductivity (100 % IACS) is requested and mechanical strength may be low. Typical applications of Cu-ETP strip are stamping
contactCu-ETP specifications. Cu-UTP must contain at least 99.9% copper and additionally have an oxygen content of between 0.02% to 0.04%. As with OF copper, the silver content is counted as copper (Cu) for purity purposes. Cu-ETP is an electrolytically-refined copper that is frequently used in electrical and electronic applications.
contact2 · Cu-ETP, also known as Copper Electrolytic Tough Pitch, is a type of copper that is widely used in the electrical industry due to its high electrical conductivity and resistance to corrosion. The chemical composition of Cu-ETP is typically made up of 99.90% copper, with trace amounts of other elements such as oxygen, sulfur, and phosphorus. ...
contact201712 · CW004A Cu-ETP E-Cu57/E-Cu58 2.0060/2.0065 12 CW101C Cu Be2 Cu Be2 2.1247 CW103C Cu Co1 Ni1 Be - - CW104C Cu Co2 Be Cu Co2 Be 2.1285 CW106C Cu Cr1 Zr Cu Cr Zr 2.1293 Sechskantstangen hexagon bars CW004A Cu-ETP E-Cu57/E-Cu58 2.0060/2.0065 CW104C Cu Co2 Be Cu Co2 Be 2.1285 13 CW106C Cu Cr1 Zr Cu
contact2021315 · CU-ETP CUETP. . 7. M006 CU-DLP MS58 MS59 MS60 MS62 MS65 MS67 MS68 MS69 MS70 MS72 MS75 MS78 MS80 MS82 MS85 MS88 MS89 MS90 MS92 MS95 MS98 ALBROMET w200 ALBROMET w130 ALBROMET w164 ALBROMET 380 ALBROMET w164
contactKupfer-HalbzeugCW004A (Cu-ETP - 2.0065) Batz + Burgel ist seit mehr als 25 Jahren kompetenter Partner der Industrie im Bereich Metallhandel und Metallbearbeitung. Eine große Sortimentstiefe, unsere hohe Fertigungskompetenz, von Einzelteilen bis zur Vormontage komplexer Baugruppen, sowie schnelle und flexible Reaktion zeichnen
contact20211018 · EN 1652 Grade Cu-ETP R240 Description Cu-ETP, mat. No CW004A, is an oxygenous copper with Cu >= 99,9%. To the comparable DIN-mark E-Cu58, mat. No 2.0065 acc. to DIN 1787 : 1973-01 applies: The most excellent material property is its high thermal and electrical conductivity. Tensile strength and Brinell hardness are increasable
contact20211028 · Electrolytic tough-pitch copper (Cu-ETP) is the standard oxygen containing pure copper grade. It is very commonly used for electronics and electric engineering components in cases that high conductivity (100 % IACS) is requested and mechanical strength may be low. Typical applications of Cu-ETP strip are stamping
contact2020131 · Cu-ETP kommt zum Einsatz, wenn hohe elektrische Leit-fähigkeit verlangt wird (Elektrotechnik, Elektronik) [1]. °C 2. Chemische Zusammensetzung - nach DIN EN - Legierungsbestandteile Massenanteil in % Cu 1) Bi O 2) Pb min. 99,9 max. 0,0005 max. 0,04 max. 0,005 Zulässige Beimengungen bis Massenanteil in % Sonstige zusammen
contact2 · Cu-ETP, also known as Copper Electrolytic Tough Pitch, is a type of copper that is widely used in the electrical industry due to its high electrical conductivity and resistance to corrosion. The chemical composition of Cu-ETP is typically made up of 99.90% copper, with trace amounts of other elements such as oxygen, sulfur, and phosphorus. ...
contact2023322 · Electrolytic-tough pitch (ETP) copper. Electrolytic tough pitch copper, UNS C11000, is pure copper (with a maximum of 0.0355% of impurities) refined by electrolytic refining process and it is the most widely used grade of copper all over the world.ETP has a minimum conductivity rating of 100% IACS and is required to be 99.9% pure. It has
contact201712 · CW004A Cu-ETP E-Cu57/E-Cu58 2.0060/2.0065 12 CW101C Cu Be2 Cu Be2 2.1247 CW103C Cu Co1 Ni1 Be - - CW104C Cu Co2 Be Cu Co2 Be 2.1285 CW106C Cu Cr1 Zr Cu Cr Zr 2.1293 Sechskantstangen hexagon bars CW004A Cu-ETP E-Cu57/E-Cu58 2.0060/2.0065 CW104C Cu Co2 Be Cu Co2 Be 2.1285 13 CW106C Cu Cr1 Zr Cu
contactWinland Metalは、のC11000 / C1100 / Cu-ETPシームレスをしています C11000のとして、C12200グレードのには、のをさせるために、プロセスに0.015％のリンがされています。
contactKupfer, Cu, Cu-ETP, Cu-OF, CW004A, CW008A, Cu-DHP, CW024A, CuBe2, CW101C, C11000, C10200, C12200, C1100, C1020, C1220, C1221, EN 13606, EN 12166
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